NIKON OPTISTATION-3000
Its efficient transfer sequence, new robotic arm, FOUP opener, and enhanced macro observation functions all contribute to especially high yield rates – making the OST-3000 a high throughput wafer i...
NIKON OPTISTATION-3100
Engineered to provide cost-effective support for 300mm wafers with a minimal footprint, the Optistation-3100 features an advanced micro/macro system in a compact, flexible design. The optical syste...
NIKON OPTISTATION-3200
One of Nikon's most advanced and versatile semiconductor inspection systems, the Optistation 3200 provides three-mode macro inspection capability – front, backside center, and backside perimeter – ...
NIKON OPTISTATION-7
Built to accept the latest technology in wafer transport, and incorporating its own integrated ULPA filtration system, the Optistation-7 easily exceeds new fab automation requirements. Nikon semico...
NIKON P3
The Nikon P3 system is designed for automated pattern profile management and line width roughness monitoring of 300mm wafers with fully incorporated macro defect detection, EBR inspection, and auto...